Method of manufacturing a semiconductor structure with treatment to sacrificial stop layer producing diffusion to an adjacent low-k dielectric layer lowering the constant
AssigneeAdvanced Micro Devices, Inc.
InventorsCalvin T. Gabriel, Suzette K. Pangrle, Lynne A. Okada, Fei Wang
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Abstract
A method of manufacturing a low-k semiconductor structure including the steps of forming a low-k dielectric layer, forming a sacrificial etch stop layer adjacent the low-k dielectric layer, and applying energy to the sacrificial etch stop layer to diffuse a component of the sacrificial etch stop layer into the adjacent low-k dielectric layer. This diffusion of the component lowers the dielectric constant of the adjacent low-k dielectric layer.
Claims18
A method of manufacturing a low-k semiconductor structure, comprising the steps of:
- forming a low-k dielectric layer;
- forming a sacrificial etch stop layer adjacent the low-k dielectric layer;
- and
- applying energy to the sacrificial etch stop layer to diffuse a component of the sacrificial etch stop layer into the adjacent low-k dielectric layer,
- wherein the diffusion of said component lowers the dielectric constant of the adjacent low-k dielectric layer.
The method of manufacturing a low-k semiconductor device, comprising the steps of:
- forming a metallization layer;
- forming an etch stop layer on the metallization layer;
- forming a first low-k dielectric layer on the etch stop layer;
- forming a sacrificial carbon-bearing middle stop layer on the first low-k dielectric layer;
- forming a second low-k dielectric layer on the sacrificial carbon-bearing middle stop layer;
- and
- applying energy to the sacrificial carbon-bearing middle stop layer stack to diffuse carbon from the sacrificial carbon-bearing middle stop layer at least one of the first and second low-k dielectric layers,
- wherein the diffusion of carbon into the first or second low-k dielectric layer lowers the dielectric constant of the corresponding low-k dielectric layer.
Dependencies are inferred from the claim text.