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US 6,475,891 B2Granted
Method of forming a pattern for a semiconductor device
AssigneeSamsung Electronics Co., Ltd.
InventorHong-Bae Moon
Life of this patent
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Abstract
A method of forming a pattern for a semiconductor device without using a photolithography technique is disclosed, wherein the method includes forming a sacrificial layer on a semiconductor substrate, forming a sacrificial layer pattern by patterning the sacrificial layer, forming a conformal layer on a resultant structure after forming the sacrificial layer pattern, and forming the layer pattern by anisotropically etching the conformal layer.
Claims16
A method of forming a layer pattern for a semiconductor device, comprising the steps of:
- forming a sacrificial layer on a semiconductor substrate;
- forming a sacrificial layer pattern by patterning the sacrificial layer;
- forming a conformal layer on a resultant structure formed after the step of forming the sacrificial layer pattern;
- forming the layer pattern by anisotropically etching the conformal layer;
- and
- planarizing an upper surface of the sacrificial layer pattern and the layer pattern.
3 more elements
A method of forming a pattern for a semiconductor device, comprising:
- forming a sacrificial layer on a semiconductor substrate having a cell region and a peripheral region;
- forming a sacrificial layer pattern on the semiconductor substrate of the cell region;
- forming a conformal layer on the entire surface of the semiconductor substrate including the sacrificial layer pattern;
- forming a photoresist pattern on the conformal layer formed at the peripheral region;
- and
- anisotropically etching the conformal layer to expose the semiconductor substrate, thereby forming a first pattern comprised of the conformal layer on sidewalls of the sacrificial layer pattern in the cell region and a second pattern beneath the photoresist pattern in the peripheral region, wherein the second pattern has a line width relatively greater than that of the first pattern.
3 more elements
Dependencies are inferred from the claim text.