Method for fabricating multi-channel array optical device

A method for fabricating a multi-channel array optical device, comprising the steps of:

• a first step for forming a plurality of semiconductor mirror layers on a semiconductor substrate;
• a second step for forming an oxidization protective layer on the plurality of semiconductor mirror layers;
• a third step for selectively removing the oxidization protective layer by using a binary mask to expose the semiconductor mirror layers, a wave length of which will be adjusted;
• a fourth step for oxidizing the exposed semiconductor mirror layers;
• and
• a fifth step for removing the oxidization protective layer remaining on the unexposed semiconductor mirror layers;
• and
• wherein after completing the fifth step, the subprocess from the second step to the fifth step is repeated at least one time and the binary mask being used in each subprocess has a light exposure width different from those of the binary masks used in previous repetitions of the subprocess defined by the second step through the fifth step.