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US 6,475,722 B1Granted
Surface treatments for DNA processing devices
AssigneeCuraGen Corporation
InventorSteven A. Henck
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AssigneeCuraGen Corporation
InventorSteven A. Henck
Estimating the term…
The present invention discloses methodologies for the treatment of the surface(s) of DNA processing devices so as to greatly reduce DNA adsorption to the surface(s) exposed to the DNA-containing media. These aforementioned surface treatments include: (i) the deposition of thin-films of silicon-rich, silicon nitride and of hydroxyl-containing,low-temperature silicon oxide and (ii) the washing of surface with a basic, oxidative wash solution. The present invention also discloses the fabrication of DNA processing devices utilizing surface(s) treated by the methods described above. Such DNA processing devices include, for example, miniaturized electrophoresis and other DNA separation devices, miniaturized PCR reactors, and the like. The present invention further discloses methodologies for testing the degree of DNA adherence to a given surface. Additionally, the methodologies and devices of the present invention are also applicable to the processing of nucleic acids, in generally.
A method for reducing the amount of nucleic acid bound to one or more surfaces used in a device for contacting a medium containing nucleic acids, the method comprising:
A method for minimizing adsorption of nucleic acids to a surface, the method comprising:
A method for minimizing adsorption of a nucleic acid to a surface, the method comprising treating said surface with a fluid comprising an alkalinizing agent and an oxidizing agent under conditions sufficient to minimize adsorption of a nucleic acid to said surface.
Dependencies are inferred from the claim text.