Chemically amplified positive resist composition
AssigneeSumitomo Chemical Company, Limited
InventorsYasunori Uetani, Seong-Hyeon Kim, Yoshiyuki Takata
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Abstract
A chemically amplified positive resist composition excellent in sensitivity and resolution as well as other resist performance characteristics comprising a resin (X) which has a polymeric unit represented by the following formula (I): wherein R1 represents hydrogen or methyl, R2 and R3 represent alkyl having 1 to 4 carbon atoms, and R4 and R5 represent hydrogen, hydroxyl or alkyl, polymeric unit represented by the following formula (II): and a polymeric unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride; and an acid generating agent (Y).
Claims7
A chemically amplified positive resist composition comprising
- a resin (X) which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali when subjected to an action of acid, and has
- (a) a polymeric unit represented by the following formula (I):
- wherein R1 represents hydrogen or methyl, R2 and R3 each independently represent alkyl having 1 to 4 carbon atoms, and R4 and R5 each independently represent hydrogen, hydroxyl or alkyl, wherein the adamantly ring bonds to the carbon linking R2 and R3 at either the 1-position or the 2-position,
- (b) polymeric unit, derived from an alicyclic olefin, represented by the following formula (II):
- wherein R6 and R7 each independently represent hydrogen, alkyl having 1 to 3 carbon atoms, hydroxyalkyl having 1 to 3 carbon atoms, carboxyl, cyano or a group represented by —COOR8, wherein R8 represents an alcohol residue,
- or R6and R7 together form a carboxylic acid anhydride residue represented by —C(═O)OC(═O)—, and
- (c) a polymeric unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride;
- and
- an acid generating agent (Y).
Dependencies are inferred from the claim text.