Discharge plasma processing device
AssigneeNihon Shinku Gijutsu Kabushiki Kaisha
InventorTaijiro Uchida
Life of this patent
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Abstract
A discharge plasma processing device comprising a chamber with an evacuation system, a magnetic field generation system and an electric field application system with which the feature of operation is first to form a magnetic neutral line in the vacuum chamber and second to produce a plasma along the magnetic neutral line by controlling the shape of the line, its position related to an object to be processed and the plasma parameters is presented as useful device for many kinds of plasma processing like as sputtering, etching and plasma enhanced CVD as freely programmed, for instance extremely in uniform on the surface of the object.
Claims16
A discharge plasma processing device including a vacuum chamber for processing an object with plasma, said device further comprising, within the vacuum chambers, a magnetic field generating means for forming a magnetic neutral line of zero magnetic field points connected continuously in the vacuum chambers and an electric field generating means for applying an electric field along the magnetic neutral line formed in the vacuum chamber in order to produce a discharge plasma along the magnetic neutral line.
A discharge plasma processing device including a vacuum chamber for processing an object with plasma, said device comprising, within the vacuum chamber, a magnetic field generating means for forming a straight magnetic neutral line of zero magnetic field points connected in sequence in the vacuum chamber, first and second electrodes respectively disposed at opposite ends of said straight magnetic neutral line, and an electric field generating means for applying a direct or an alternating electric field along the straight magnetic line between said first and second electrodes in order to produce a linear plasma source.
Dependencies are inferred from the claim text.