Interlocking chemical mechanical polishing system
AssigneeLam Research Corporation
InventorsJohn Boyd, Katgenahalli Y. Ramanujam, Sridharan Srivatsan, Xuyen Pham
Life of this patent
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Abstract
An interlocking polishing belt apparatus is disclosed. The interlocking polishing belt apparatus includes an interlocking belt, which includes a plurality of studs each having an upper stud end and a lower stud end. In addition, the interlocking polishing belt apparatus includes a polishing belt that is in contact with the interlocking belt. The polishing belt has a plurality of polishing belt stud holes, each configured to interlock with an upper stud end.
Claims13
In a chemical mechanical polishing system, an interlocking polishing belt apparatus, comprising:
- an interlocking belt having a plurality of studs, each stud comprising an upper stud end and a lower stud end;
- and
- a polishing belt in contact with the interlocking belt, the polishing belt having a plurality of polishing belt stud holes, wherein each of the polishing belt stud holes is capable of interlocking with an upper stud end.
In a chemical mechanical polishing system, an interlocking polishing belt system, comprising:
- at least one drum having a plurality of stud receiving holes;
- an interlocking belt having a plurality of studs, each stud comprising an upper stud end and a lower stud end, wherein the lower stud end of each stud is capable of being inserted into a stud receiving hole of the drum;
- a polishing belt in contact with the interlocking belt, the polishing belt having an outer surface and an inner surface, the polishing belt further having a plurality of polishing belt stud holes disposed within the inner surface, wherein each of the polishing belt stud holes is capable of interlocking with an upper stud end;
- and
- a carrier capable of applying a wafer to the outer surface of the polishing belt.
Dependencies are inferred from the claim text.