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US 6,475,293 B1Granted
Rotating belt wafer edge cleaning apparatus
AssigneeIntel Corporation
InventorsMonsour Moinpour, Ilan Berman, Young C. Park
Life of this patent
Estimating the term…
Abstract
An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.
Claims7
A method for cleaning an edge of a wafer comprising:
- rotating an abrasive belt along a first and a second roller having a first and a second axis of rotation, respectively, said second axis of rotation being fixed in relationship to said first axis of rotation;
- rotating the wafer about a third axis of rotation, said third axis of rotation being not parallel to either of said first or said second axes of rotation;
- positioning said abrasive belt against the edge of the wafer;
- and
- controlling a force applied to the wafer with one or more springs.
2 more elements
A method for cleaning an edge of a wafer comprising:
- rotating an abrasive belt along a first and a second roller having a first and a second axis of rotation, respectively, said first and said second rollers being spring mounted to a carrier;
- rotating the wafer about a third axis of rotation, said third axis of rotation being not parallel to either of said first or said second axes of rotation;
- moving said carrier to engage said abrasive belt with the edge of the wafer;
- and
- controlling a force applied to the wafer with said mounted springs.
2 more elements
Dependencies are inferred from the claim text.