Apparatus for holding and engaging micro-machined objects and method for making same

A method of making an apparatus for holding micro sized objects, comprising:

• providing a first layer of material for forming a mounting block;
• bonding a second layer of material onto the first layer of material;
• placing a first pattern of photo resist onto the second layer of material to protect a portion of the surface of the second layer and to define the boundaries of openings to be etched from the second layer;
• etching the second layer to remove material from the second layer to form openings within the second layer;
• bonding a third layer of material onto the second layer of material;
• placing a second pattern of photo resist onto the third layer of material to protect a portion of the surface of the third layer and to define the boundaries of at least one resilient member and corresponding openings to be etched from the third layer;
• and
• etching the third layer to remove material from the third layer to form at least one resilient member and corresponding openings within the third layer;
• wherein the resilient member is coupled at one end to the mounting block to allow for biasing against an object placed within an opening formed by the second and third layers of material.

A method of making an apparatus for holding micron sized objects, comprising:

• providing a first layer of material for forming a mounting block;
• placing a first pattern of photo resist onto the first layer of material to protect a portion of the surface and to define the boundaries of predetermined openings to be etched in the surface;
• etching the first layer to remove material from the first layer to form openings within the first layer;
• attaching a second layer of material onto the first layer of material;
• placing a second pattern of photo resist onto the second layer of material to protect a portion of the surface of the second layer and to define the boundaries of at least one resilient member and at least one corresponding opening to be etched from the second layer;
• etching the second layer to remove material from the second layer to form at least one resilient member and corresponding openings within the second layer;
• wherein the resilient member is coupled at one end to the mounting block to allow for biasing against an object placed within an opening formed by the first and second layers of material.