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US 6,473,237 B2Granted
Point array maskless lithography
AssigneeBall Semiconductor, Inc.
InventorWenhui Mei
Life of this patent
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Abstract
A system for performing digital lithography onto a subject is provided. The system includes a noncoherent light source for producing a first light and an optical diffraction element for individually focusing the first light into a plurality of second lights. The system also includes a pixel panel for generating a digital pattern, the pixel panel having a plurality of pixels corresponding to the plurality of second lights. A lens system may then direct the digital pattern to the subject, thereby enabling the lithography.
Claims5
A system for performing digital-lithography onto a subject, the system comprising:
- a light source for producing a first light;
- an optical element for individually focusing the first light into a plurality of second lights;
- a pixel panel for generating a digital pattern, the pixel panel having a plurality of pixels corresponding to the plurality of second lights;
- and
- a lens system for directing the digital pattern to the subject.
2 more elements
Dependencies are inferred from the claim text.