Alignment free interferometer and alignment free method of profiling object surfaces
AssigneePLX, Inc.
InventorsItai Vishnia, Zvi Bleier
Life of this patent
Estimating the term…
Loading patent…
AssigneePLX, Inc.
InventorsItai Vishnia, Zvi Bleier
Estimating the term…
An improved method and apparatus for profiling surfaces is provided. The subject apparatus avoids the earlier used constructions of such apparatus in the normally used Fizeau interferometer form, and instead uses a retroreflector (200) located at the end of the optical path (128) of the beam reflecting off of the surface under test (150) in order to achieve alignment-free surface profiling. In addition, in a second embodiment, a second retroreflector (140′) is used to assure a more accurate result. While in yet another improvement, the retroreflector (200) is selectively moveable in relation to the optical path of the beam, to compensate and correct for a shearing effect resulting from the use of variously sized (thicknesses) flats under test.
An interferometer assembly, comprising:
An interferometer assembly, comprising:
An interferometer assembly, comprising:
An interferometer assembly, comprising:
An interferometer assembly, comprising:
An interferometer assembly, comprising:
A method of profiling an object surface using an alignment-free interferometer, comprising the steps of:
A method of profiling an object surface using an alignment-free interferometer, comprising the steps of:
A method of profiling an object surface using an alignment-free interferometer, comprising the steps of:
Dependencies are inferred from the claim text.