Resist removal monitoring by raman spectroscopy
AssigneeAdvanced Micro Devices, Inc.
InventorsLynette K. Ballast, Mark R. Breen
Life of this patent
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Abstract
Various methods of inspecting a workpiece for residue are provided. In one aspect, a method of inspecting a workpiece for carbon residue includes directing coherent radiation at the workpiece to produce Rayleigh scattered radiation and Raman scattered radiation. The Rayleigh scattered radiation is filtered out. A spectrum for the Raman scattered radiation is detected and compared with a known Raman spectrum for carbon. Wafers may be inspected for residues, such as graphitic carbon, in a non-destructive way and without pump down. Deficiencies in resist stripping may be quickly identified.
Claims25
A method of inspecting a semiconductor workpiece for carbon residue, comprising:
- directing coherent radiation at the semiconductor workpiece to produce Rayleigh scattered radiation and Raman scattered radiation;
- filtering out the Rayleigh scattered radiation;
- detecting a spectrum for the Raman scattered radiation;
- and
- comparing the detected spectrum with a known Raman spectrum for carbon.
A method of inspecting a semiconductor wafer for carbon-based photoresist residue, comprising:
- directing coherent radiation at the wafer to produce Rayleigh scattered radiation and Raman scattered radiation;
- filtering out the Rayleigh scattered radiation;
- detecting a spectrum for the Raman scattered radiation;
- and
- comparing the detected spectrum with;
- a known Raman spectrum for graphitic carbon.
A method of processing a semiconductor workpiece having a carbon-based resist film, comprising:
- stripping the carbon-based resist film;
- and
- inspecting the workpiece for carbon-based residue by directing coherent radiation at the workpiece to produce Rayleigh scattered radiation and Raman scattered radiation, filtering out the Rayleigh scattered radiation, detecting a spectrum for the Raman scattered radiation, and comparing the detected spectrum with a known Raman spectrum for carbon.
Dependencies are inferred from the claim text.