Projection exposure apparatus and device manufacturing method including an aperture member having a circular light transmitting portion and a light blocking member
AssigneeCanon Kabushiki Kaisha
InventorsAkiyoshi Suzuki, Miyoko Noguchi
Life of this patent
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Abstract
A projection exposure apparatus includes a light source for emitting light, a condensing optical system for receiving the light from the light source, for condensing the received light and for impinging the condensed light on a mask having a circuit pattern, a projection lens system for projecting the light passed through the mask onto a surface of a wafer, and an aperture member provided between the light source and the condensing optical system. The aperture member has a circular light transmitting portion for transmitting the light from the light source and a light blocking member extending across the circular light transmitting portion.
Claims11
A projection exposure apparatus comprising:
- a light source for emitting light;
- a condensing optical system for receiving the light from said light source, for condensing the received light and for impinging the condensed light on a mask having a circuit pattern;
- a projection lens system for projecting the light passed through the mask onto a surface of a wafer;
- and
- an aperture member provided between said light source and said condensing optical system, wherein said aperture member has a circular light transmitting portion for transmitting the light from said light source and a light blocking member extending across the circular light transmitting portion such that even when the circuit pattern contains a fine pattern having a k1 of 0.5, zero order diffracted light and one of positive first order diffracted light and negative first order diffracted light produced by the fine pattern enter a pupil of said projection lens system.
A projection exposure apparatus comprising:
- an illumination optical system for illuminating a mask with light from a light source;
- and
- a projection optical system for projecting a pattern of the mask illuminated by said illumination optical system,
- wherein said illumination optical system has a circular light transmitting portion for transmitting the light from the light source and a light blocking member extending across the circular light transmitting portion such that even when the circuit pattern contains a fine pattern having a k1 of 0.5, zero order diffracted light and one of positive first order diffracted light and negative first order diffracted light produced by the fine pattern enter a pupil of said projection optical system.
Dependencies are inferred from the claim text.