Step mask
AssigneePhotronics, Inc.
InventorGuangming Xiao
Life of this patent
Estimating the term…
Abstract
A step mask having a plurality of test cells and a method for producing the same. Each test cell of the step mask is etched for a different amount of time and therefore has a different etch depth or height. The number of phase shifter layer etch iterations can be conducted on a column-by-column and row-by-row basis to decrease the number of etch iterations.
Claims16
A step mask comprising a substrate and a layer of phase shifter material, said phase shifter layer including a plurality of cells organized in an array of columns and rows, the phase shifter material at each of said cells having a different step height such that the step height of said phase shifter material for each column of said cells is different than the step height of an adjacent column of cells by at least a first predetermined amount.
A step mask comprising a substrate and a layer of opaque material, including a plurality of cells organized in an array of columns and rows, the substrate material at each of said cells having a different step height such that the step height of said substrate material for each column of said cells is different than the step height of an adjacent column of cells by at least a first predetermined amount.
Dependencies are inferred from the claim text.