Electron beam exposure system and method of manufacturing devices using the same

A method of manufacturing devices comprising the steps of:

• detecting pattern information corresponding to control data for exposure;
• comparing, in a controller, detected pattern information regarding a pattern to be exposed onto a wafer, with pattern information corresponding to control data for exposure stored in a memory;
• sending the detected pattern information from the controller when information corresponding to control data for exposure in the memory is not provided;
• receiving control data corresponding to the sent pattern information;
• storing the received control data in the memory;
• and
• deflecting an electron beam and exposing the wafer in accordance with the control data stored in the memory.

A method of controlling an exposure apparatus, comprising the steps of:

• storing control data for exposure in a memory;
• retrieving control data for exposure from the memory corresponding to exposure pattern information and sent from a device for exposure;
• and
• sending the control data for exposure retrieved from the memory that corresponds to the exposure pattern information to the device for exposure.

An exposure apparatus comprising:

• a memory which stores data;
• a detector for detecting information relating to a pattern to be exposed on a wafer;
• and
• a controller, which requires control data for exposure corresponding to the detected information when said memory does not store control data corresponding to the detected information, and stores the required control data in said memory.

A method of manufacturing devices, comprising the steps of:

• detecting information relating to a pattern to be exposed on a wafer;
• requiring control data for exposure corresponding to the detected information when the control data corresponding to the detected information is not stored in a memory;
• storing the required control data in the memory;
• exposing the wafer in accordance with the control data stored in the memory;
• and
• developing the exposed wafer.