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US 6,472,541 B2Granted
Protecting groups with increased photosensitivities
AssigneeThe Regents of the University of California
InventorsRoger Y. Tsien, Toshiaki Furuta
Life of this patent
Estimating the term…
Abstract
Protecting groups derived from a halogenated coumarin group, a quinoline-2-one group, a xanthene group, a thioxanthene group, a selenoxanthene group, or an anthracene group are described. The protecting groups is photolabile and can be removed by irradiating the group with light, such as flash photolysis with ultraviolet radiation or pulsed infrared radiation.
Claims19
A compound of formula
- wherein:
- A is —OH, —OC(O)CH3, NH2, or —NHCH3;
- each of X1 and X2, independently, is H, Cl, Br, or I, with at least one of X1 and X2 being Cl, Br, or I;
- Q is —O—,—NH—, or —NCH3—;
- Y1 is —H, —Cl, —Br, —I, —C(O)OH, —NO2, —C(O)NHR1, —CN, —C(O)H, —C(O)CH3, benzoxazol-2-yl, benzothiazol-2-yl, or benzimidazol-2-yl;
- Y2 is —H, —C(O)OH, or —SO3H;
- M1 is —H, —CH3, —NR2R3, —C(O)NR2R3, or —COOH;
- Z is —Cl, —Br, —I—, —OH, —OC(O)R4, —OP(O)R5R6 and M2 is —H;
- or Z and M2 together are ═N2, ═O, or ═NNHR1;
- each of R1, R2, and R3, independently, is a substituted or unsubstituted moiety selected from the group consisting of a C1-20 alkyl, a C2-20 alkenyl, a C2-20 alkynyl, a C1-20 alkoxy, a C1-20 thioalkoxy, a C1-20 alkylsulfonyl, a C4-16 arylsulfonyl, a C2-20 heteroalkyl, a C2-20 heteroalkenyl, a C3-8 cycloalkyl, a C3-8 cycloalkenyl, a C4-16 aryl, a C4-16 heteroaryl, and a C2-30 heterocyclyl;
- and
- each of R4, R5, and R6 independently, is a substituted or unsubstituted moiety selected from the group consisting of a C1-20 alkyl, a C2-20 alkenyl, a C4-16 aryl, a C2-20 heteroalkyl, an amino acid radical, a peptide radical, a polynucleotide radical, and a nucleoside radical or R5 and R6 together can form a nucleoside diradical;
- or a salt thereof.
10 more elements
Dependencies are inferred from the claim text.