Methods of semiconductor processing
AssigneeMicron Technology, Inc.
InventorsSalman Akram, David R. Hembree
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AssigneeMicron Technology, Inc.
InventorsSalman Akram, David R. Hembree
Estimating the term…
The present invention includes electronic device workpieces, methods of semiconductor processing and methods of sensing temperature of an electronic device workpiece. In one aspect, the invention provides an electronic device workpiece including: a substrate having a surface; a temperature sensing device borne by the substrate; and an electrical interconnect formed upon the surface of the substrate, the electrical interconnect being electrically coupled with the temperature sensing device. In another aspect, a method of sensing temperature of an electronic device workpiece includes: providing an electronic device workpiece; supporting a temperature sensing device using the electronic device workpiece; providing an electrical interconnect upon a surface of the electronic device workpiece; electrically coupling the electrical interconnect with the temperature sensing device; and sensing temperature of the electronic device workpiece using the temperature sensing device.
A method of semiconductor processing, comprising:
Dependencies are inferred from the claim text.