Apparatus and method for preparing backside-ground wafers for testing
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsKuang-Peng Lin, Hung-Jen Tsai, Hsien-Tsong Liu
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsKuang-Peng Lin, Hung-Jen Tsai, Hsien-Tsong Liu
Estimating the term…
A method and an apparatus for preparing a backside-ground wafer for testing are described. The method includes the steps of first providing a calibration wafer that has a pattern formed on a top surface of an insulating material such as oxide or nitride. Three droplets of water are applied with each droplet sufficiently apart from the other droplets on the top surface of the calibration wafer. A backside-ground wafer that has a ground backside and a front side to be tested is then mated to the calibration wafer by mating the ground backside to the top surface of the calibration wafer with water droplets therein-between forming a bond by capillary reaction in-between the oxide pattern on the calibration wafer. The apparatus for mounting a backside-ground wafer to a calibration wafer consists of a slanted block having a top surface with a slant angle between about 10° and about 30°.
A method for preparing a backside-ground wafer for testing comprising the steps of:
A method for preparing a backside-ground wafer for testing by using a wafer mounting block comprising the steps of:
Dependencies are inferred from the claim text.