Photonic device having an integral guide and method of manufacturing
AssigneeGore Enterprise Holdings, Inc.
InventorsRobert F. Traver, Jr., Theodore D. Lowes, Mark N. Donhowe, Sean P. Kilcoyne
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Abstract
A process is provided for creating microstructure coupling guides for aligning photonic devices with optical signal carrying apparatuses. The process includes applying a photoresist to a semiconductor material, spinning the semiconductor material, baking the semiconductor material, exposing the photoresist, baking the semiconductor material a second time, and developing the resist. The process creates a microstructure that acts as an integral guide to align and maintain the relative position between an optical signal carrying apparatus and a photonic device.
Claims28
Preparing a photonic device comprising:
- a) applying a photoresist to a material having the photonic device;
- b) spinning the material to substantially evenly distribute the photoresist on the material;
- c) baking the material;
- d) imaging the photoresist;
- e) baking the material a second time;
- and
- f) developing the photoresist, thereby forming an integral guide on the photonic device, wherein the integral guide extends outwardly from the material to form a protrusion and is configured to align and receive an optical signal conveying element.
Preparing a photonic device comprising:
- a) applying a photoresist to a material having the photonic device;
- b) spinning the material to distribute the photoresist substantially evenly on the material;
- c) baking the material;
- d) imaging the photoresist;
- e) baking the material a second time;
- f) developing the photoresist;
- g) depositing a metal within a region defined by the developed photoresist;
- and
- h) removing the photoresist, thereby forming an integral guide on the photonic device, wherein the integral guide extends outwardly from the material to form a protrusion and is configured to align and receive an optical signal conveying element.
Dependencies are inferred from the claim text.