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US 6,472,120 B1Granted
Photosensitive polymer and chemically amplified photoresist composition containing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsDong-won Jung, Sang-jun Choi, Si-hyeung Lee, Sook Lee
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Abstract
The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.
Claims6
A chemically amplified photoresist composition comprising:
- one or more photosensitive polymers each having an average-weight molecular weight of 3,000 to 100,000;
- and
- a photoacid generator contained in an amount of 1 to 15% by weight based on the total weight of the one or more photosensitive polymers, and
- wherein at least one of the one or more the photosensitive polymers includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride, and wherein the C1 to C12 aliphatic alcohol is secondary alcohol.
1 more element
Dependencies are inferred from the claim text.