US 6,472,012 B2 · Antireflection film, process for forming the antireflection film, and antireflection glass

Abstract

The present invention relates to an antireflection film effective for improving the transparency of an image display device such as a liquid crystal display (LCD), a plasma display (PDP), CRT, EL or a touch panel, to an optical product made of glass, such as a lens for eye glasses, and to an antireflection glass. The present invention is also directed to a process of coating a glass surface with a mixture comprising particular silicon compounds and thermosetting the coating film at a temperature ranging from 480 to 520° C. This process can be used to form an antireflection film on a glass surface having a refractive index ranging from 1.33 to 1.38 and a contact angle of water of at most 40 degrees.

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Drawings

Claims7

Dependent claims

A process for forming an antireflection film as adhered on a glass surface, which comprises preparing a reaction mixture comprising a silicon compound (A) of the following formula (1):

Si(OR)4 (1)
wherein R is a C1-5 alkyl group, a silicon compound (B) of the following formula (2):
R1Si(OR2)3 (2)
wherein R1 is a C1-18 organic group, and R2 is a C1-5 alkyl group, an alcohol (C) of the following formula (3):
R3CH2OH (3)
wherein R3 is a hydrogen atom or an unsubstituted or substituted C1-12 alkyl group, and oxalic acid (D), in a ratio of from 0.05 to 4.5 mol of the silicon compound (B) per mol of the silicon compound (A), in a ratio of from 0.5 to 100 mol of the alcohol (C) per mol of the total alkoxy groups contained in the silicon compounds (A) and (B), and in a ratio of from 0.2 to 2 mol of the oxalic acid per mol of the total alkoxy groups contained in the silicon compounds (A) and (B);
heating the reaction mixture at a temperature of from 50 to 180° C. until the total amount of the silicon compounds (A) and (B) remaining in the reaction mixture becomes at most 5 mol %, while maintaining a SiO2 concentration of from 0.5 to 10 wt % as calculated from silicon atoms in the reaction mixture and maintaining absence of water, to form a polysiloxane solution;
coating the polysiloxane solution on a glass surface to form a coating film;
and heat-curing the coating film at a temperature of from 480 to 520° C.

6 more elements

An antireflection film having a refractive index of from 1.33 to 1.38 and a contact angle of water of at most 40°, which is formed as adhered on a glass surface, by preparing a reaction mixture comprising a silicon compound (A) of the following formula (1):

Si(OR)4 (1)
wherein R is a C1-5 alkyl group, a silicon compound (B) of the following formula (2):
R1Si(OR2)3 (2)
wherein R1 is a C1-18 organic group, and R2 is a C1-5 alkyl group, an alcohol (C) of the following formula (3):
R3CH2OH (3)
wherein R3 is a hydrogen atom or an unsubstituted or substituted C1-12 alkyl group, and oxalic acid (D), in a ratio of from 0.05 to 4.5 mol of the silicon compound (B) per mol of the silicon compound (A), in a ratio of from 0.5 to 100 mol of the alcohol (C) per mol of the total alkoxy groups contained in the silicon compounds (A) and (B), and in a ratio of from 0.2 to 2 mol of the oxalic acid per mol of the total alkoxy groups contained in the silicon compounds (A) and (B);
heating the reaction mixture at a temperature of from 50 to 180° C. until the total amount of the silicon compounds (A) and (B) remaining in the reaction mixture becomes at most 5 mol %, while maintaining a SiO2 concentration of from 0.5 to 10 wt % as calculated from silicon atoms in the reaction mixture and maintaining absence of water, to form a polysiloxane solution;
coating the polysiloxane solution on a glass surface to form a coating film;
and heat-curing the coating film at a temperature of from 480 to 520° C.

6 more elements

Dependencies are inferred from the claim text.

Description4,097 words

Summary2,534 words

#The present invention relates to an antireflection film effective for improving the transparency of an image display device such as a liquid crystal display (LCD), a plasma display (PDP), CRT, EL or a touch panel, or an optical product made of glass, such as a lens for eye glasses, and an antireflection glass. Particularly, it relates to an antireflection glass excellent in mass productivity.

#A transparent substrate such as a glass substrate provided with transparent electrodes, to be used for an image display device represented by LCD, PDP, CRT, EL or a touch panel, generates a reflected light of about 4% on one side thereof, which causes deterioration in the visibility or the transmittance. Therefore, for the purpose of improving the visibility or the transmittance by reducing the amount of light reflected from the substrate, a method of forming a so-called antireflection film such as a multi-layer film prepared by laminating thin films having low reflective indices or thin films having different refractive indices, on the substrate surface, has been employed.

#In general, with an antireflection film of a multi-layer structure, effective antireflection can be realized within a wide wavelength region, but it is poor in mass productivity since a technique for controlling the film thickness of each layer with high precision is required. Therefore, some thin films having low refractive indices have been proposed which can be formed by a coating method as a method for forming an antireflection film simply and conveniently.

Detailed description1,563 words

#Now, the present invention will be described in further detail with reference to Examples, but it should be understood that the present invention is by no means restricted to such specific Examples.

#70.8 g of ethanol was charged into a four-necked flask equipped with a reflux condenser, and 12.0 g of oxalic acid was gradually added with stirring, to obtain an ethanol solution of oxalic acid.

#Then, this solution was heated to its reflux temperature, and a mixed liquid comprising 11.0 g of tetraethoxysilane and 6.2 g of tridecafluorooctyltrimethoxysilane, was dropwise added thereto under reflux.

Facts

Application

09/725,478Filed 30 Nov 2000

Priority

JP 11-35387014 Dec 1999

Published

US 2001/0012565 A19 Aug 2001

Granted

29 Oct 2002

Term ended

30 Nov 2020

Estimated · how

20 years from earliest known nonprovisional domestic filing. Maintenance-fee lapses, terminal disclaimers and statutory extensions have not been checked. The continuity chain may be incomplete; this is not an enforceability determination. Patent term adjustment is unavailable; no adjustment was added.

Classification6 codes

C03C 17/30
With organic material: with silicon-containing compounds
Y10T 428/31612
Particulate metal or metal compound-containing: as silicone, silane or siloxane
Y10T 428/31663
Of asbestos: as siloxane, silicone or silane
Y10T 428/31667
Of asbestos: next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product

Antireflection film, process for forming the antireflection film, and antireflection glass

Life of this patent

Antireflection film, process for forming the antireflection film, and antireflection glass

Life of this patent

Life of this patent

Abstract

Drawings

Drawings

Claims7

Description4,097 words

Drawings

Classification6 codes

Life of this patent

Description4,097 words