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US 6,471,919 B2Granted
Apparatus for removing impurities from effluent waste gas streams
AssigneeWinbond Electronics Corp.
InventorsChung-Chih Wang, Jerry Sun, Wu-Chung Wen
Life of this patent
Estimating the term…
Abstract
An apparatus for removing fluorinated and chlorinated compounds contained in waste gas streams from semiconductor etch and deposition processes. The apparatus has a treatment chamber in which a plurality of liquid films are formed to absorb the fluorinated and chlorinated compounds contained in the waste gas streams that pass through the liquid films. The apparatus includes a tank for receiving the mixture of the absorbed fluorinated and chlorinated compounds and the liquid, and a dehumidifying device for stabilizing and dehumidifying the humidified waste gas streams.
Claims31
An apparatus for removing impurities from effluent waste gas streams, comprising:
- a) a treatment chamber having an inlet for introducing the effluent waste gas streams and an outlet;
- b) a spraying device for spraying liquid disposed in said treatment chamber to form a plurality of liquid films, each of which are spaced from each other;
- c) a plate having at least one solid and continuous surface whereon said liquid is sprayed;
- and
- d) a blower for sucking the waste gas stream upwardly through the plurality of spaced liquid films in which a portion of the impurities in the waste gas streams is mixed with the liquid to form a liquid mixture and simultaneously the waste gas stream is humidified, wherein the liquid mixture flows downward and the humidified waste gas is sucked out from the outlet of said treatment chamber.
2 more elements
An apparatus for removing impurities from effluent waste gas streams comprising:
- a) a gas treatment chamber having an inlet for introducing the effluent waste gas streams and an outlet;
- b) a spraying device for spraying liquid disposed in said treatment chamber to form a plurality of liquid films, each of which are formed horizontally and spaced from each other, the spraying device including a pipe disposed in a central portion of said treatment chamber, said pipe having a plurality of nozzles from which liquid is sprayed out toward a plurality of plate members disposed confronting said nozzles, said plate members having at least one solid and continuous surface such that the sprayed-out liquid from said nozzles impinges to form the liquid films;
- c) a blower for sucking the waste gas stream upwardly through the liquid films in which a portion of the impurities in the waste gas streams is mixed with the liquid to form a liquid mixture and simultaneously the waste gas stream is humidified, wherein the liquid mixture flows downward and the humidified waste gas is sucked out from the outlet of said treatment chamber;
- and
- d) a dehumidifying device for dehumidifying the humidified waste gas streams sucked from the outlet, disposed above said treatment chamber.
2 more elements
An apparatus for removing impurities from an effluent gas stream, the apparatus comprising:
- a treatment chamber having an inlet and an outlet, the inlet communicating the gas stream into the chamber;
- a first plate horizontally located in the chamber and having an upper surface and a lower surface, at least one of said surfaces being solid and continuous;
- a first spraying device located within the chamber and spaced from and confronting one of the surfaces of the first plate;
- wherein liquid is sprayed through the spraying device toward the first plate to form a liquid film thereon such that the effluent gas stream passes from the inlet to the first plate and spraying device to mix with the liquid sprayed from the first spraying device toward the first plate.
1 more element
An apparatus for humidifying effluent gas comprised of:
- a treatment chamber having an inlet and an outlet, the inlet communicating the gas stream into the chamber;
- a first plate horizontally located in the chamber and having an upper surface and a lower surface, wherein at least one of the surfaces is solid and continuous;
- a first spraying device located within the chamber and spaced from and confronting the solid continuous surface of the first plate, the first spraying device being centrally located with respect to the first plate;
- a second plate located horizontally in the chamber and having a top surface and a bottom surface, wherein at least one of the surfaces is solid and continuous, the second plate being horizontally spaced from the first plate, the first plate and the second plate being located between the inlet and the outlet;
- and
- a second spraying device located within the chamber and confronting the solid continuous surface of the second plate, the second spraying device being centrally located with respect to the second plate;
- wherein liquid is sprayed through the second spraying device toward the center of the second plate and from the first spraying device toward the center of the first plate to form liquid films on each plate such that the effluent gas passing by the first and second plates mixes with the liquid sprayed from the first and second spraying devices toward the first and second plates.
4 more elements
An apparatus for removing impurities from an effluent gas stream, the apparatus comprising:
- a treatment chamber having an inlet and an outlet, the inlet communicating the gas stream into the chamber;
- a plate located in the chamber and having at least one solid and continuous surface;
- a spraying device located with the chamber and spaced from and confronting the solid and continuous surface of the first plate;
- wherein liquid is sprayed through the spraying device toward the plate to form a liquid film thereon such that the effluent gas stream passing by the first plate mixes with the liquid sprayed from the spraying device toward the plate.
1 more element
Dependencies are inferred from the claim text.