Process for producing head slider
AssigneeNitto Denko Corporation
InventorsMakoto Namikawa, Haruo Ioka
Life of this patent
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Abstract
A process for producing a head slider wherein a floating surface is formed on a slider substrate by photolithography. The process for the production of a head slider has a step of forming, on a slider substrate by photolithography, a patterned floating surface having a resist material on its upper surface; a step of sticking an adhesive sheet on the upper surface of the resist material present on the floating surface; and a step of peeling off the adhesive sheet together with the resist material from the floating surface.
Claims6
A process for producing a head slider, comprising:
- placing a dry film resist material on a slider substrate;
- forming, on the slider substrate, a patterned floating surface by removing the resist material in a pattern by photolithography;
- adhering a curable pressure-sensitive adhesive formed on a sheet to the floating surface including the remaining resist material;
- curing the adhesive;
- heating the remaining resist to lower elasticity of the resist material;
- and
- peeling the adhesive sheet together with the resist material while maintaining a temperature of the resist material for lowering its elasticity, from the floating surface.
A process for producing a head slider, comprising:
- forming, on a slider substrate, a patterned floating surface by removing a resist material formed thereon in a pattern by photolithography;
- adhering an adhesive sheet on the floating surface;
- heating the resist material remaining on the slider substrate at a temperature of 40-120° C. to lower elasticity of the resist material;
- and
- peeling the adhesive sheet together with the resist material while maintaining the temperature of the resist material for lowering its elasticity, from the floating surface.
Dependencies are inferred from the claim text.