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US 6,471,836 B2Granted
Sputtering apparatus
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsAkira Okuda, Shigeru Namiki, Kiyoshi Saeki, Toshiyuki Fujioka
Life of this patent
Estimating the term…
Abstract
During sputtering for use in thin film deposition, anomalous discharge is prevented from generating between a target and a backing plate, and a target presser. In the target presser also serving as an earth shield and a deposition preventing plate, an insulating member staying in contact with the sputtering target or the backing plate is provided with a recess constituted of two or more different depths so that the recess does not come in contact with the sputtering target or the backing plate.
Claims5
A sputtering apparatus comprising:
- a reactive chamber for maintaining a vacuum therein;
- a vacuum exhaust pump for evacuating the reactive chamber to produce a pressure-reduced atmosphere therein;
- a gas supply system for supplying gas into the reactive chamber;
- a substrate holder housed in the reactive chamber, for mounting thereon a substrate to be treated with plasma;
- a cathode disposed opposite the substrate holder;
- a power source for supplying a voltage to the cathode;
- a deposition preventing plate disposed along the circumference of the substrate holder;
- and
- an insulating member integrally formed with the deposition preventing plate and interposed between the cathode and the deposition preventing plate, the insulating member having a target side and a recess in the target side opening toward a target, the recess having at least two different depths, wherein
- said insulating member operates as a target presser.
7 more elements
A sputtering apparatus comprising:
- a reactive chamber for maintaining a vacuum therein;
- a vacuum exhaust pump for evacuating the reactive chamber to produce a pressure-reduced atmosphere therein;
- a gas supply system for supplying gas into the reactive chamber;
- a substrate holder housed in the reactive chamber, for mounting thereon a substrate to be treated with plasma;
- a cathode disposed opposite the substrate holder;
- a power source for supplying a voltage to the cathode;
- a deposition preventing plate disposed along the circumference of the substrate holder;
- and
- an insulating member integrally formed with the deposition preventing plate and interposed between the cathode and the deposition preventing plate, the insulating member having a recess, the recess having at least two different depths, wherein
- said insulating member operates as a target presser.
7 more elements
A sputtering apparatus comprising:
- a reactive chamber for maintaining a vacuum therein;
- a vacuum exhaust pump for evacuating the reactive chamber to produce a pressure-reduced atmosphere therein;
- a gas supply system for supplying gas into the reactive chamber;
- a substrate holder housed in the reactive chamber, for mounting thereon a substrate to be treated with plasma;
- a cathode disposed opposite the substrate holder;
- a power source for supplying a voltage to the cathode;
- a deposition preventing plate disposed along the circumference of the substrate holder;
- and
- an insulating member integrally formed with the deposition preventing plate and interposed between the cathode and the deposition preventing plate, the insulating member having a recess, the recess having a triangular cross section and, wherein
- said insulating member operates as a target presser.
7 more elements
A sputtering apparatus comprising:
- a reactive chamber for maintaining a vacuum therein;
- a vacuum exhaust pump for evacuating the reactive chamber to produce a pressure-reduced atmosphere therein;
- a gas supply system for supplying gas into the reactive chamber;
- a substrate holder housed in the reactive chamber, for mounting thereon a substrate to be treated with plasma;
- a cathode disposed opposite the substrate holder;
- a power source for supplying a voltage to the cathode;
- a deposition preventing plate disposed along the circumference of the substrate holder;
- and
- an insulating member integrally formed with the deposition preventing plate and interposed between the cathode and the deposition preventing plate, the insulating member having a total cross-sectional contour length larger than the height of said insulating member, said height being equal to a distance between the deposition preventing plate and a backing plate, the insulating member having a recess, the recess having at least two different depths, wherein
- said insulating member operates as a target presser.
7 more elements
Dependencies are inferred from the claim text.