Apparatus and method for improving film uniformity in a physical vapor deposition system
AssigneeNovellus Systems, Inc.
InventorsJean Qing Lu, Tom Yu, Linda Stenzel, Jeffrey Tobin
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Abstract
A PVD system comprises a hollow cathode magnetron with a downstream plasma control mechanism. The magnetron has a hollow cathode with a non-planar target and at least one electromagnetic coil to generate and maintain a plasma within the cathode. The magnetron also has an anode located between the cathode and a downstream plasma control mechanism. The control mechanism comprises a first, second and third electromagnetic coil beneath a mouth of the target, vertically spaced so as to form a tapered magnetic convergent lens between the target mouth and a pedestal of the magnetron.
Claims20
A hollow cathode magnetron, comprising:
- a hollow cathode, the cathode including a target and at least one magnet to generate and maintain a high density plasma;
- an anode located beneath the cathode;
- a plurality of magnets downstream from beneath a mouth of the target positioned so as to form a tapered magnetic convergent lens between the cathode and a pedestal.
A plasma downstream control mechanism, comprising:
- a plurality of magnets disposed downstream from a mouth of a hollow cathode configured to provide high density plasma;
- and
- wherein magnets in the plurality of magnets are vertically positioned so as to form a convergent magnetic lens.
A method of magnetron sputtering, comprising:
- generating a high density plasma within a cathode of a hollow cathode magnetron;
- using the plasma to sputter atoms from a target in the hollow cathode magnetron;
- and
- forming a tapered magnetic convergent lens between a mouth of the hollow cathode magnetron and a substrate using a plurality of magnets downstream from a mouth of the hollow cathode magnetron.
Dependencies are inferred from the claim text.