Prototyping of patterned functional nanostructures
AssigneesUniversity of New Mexico, Sandia National Laboratories
InventorsHongyou Fan, Gabriel P. Lopez, Charles Jeffrey Brinker, Yunfeng Lu
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Abstract
The present invention provides a coating composition comprising: A coating composition comprising: TEOS; a surfactant; at least one organosilane; HCl; water; and ethanol. The present invention also provides films made from such a coating composition and a method for making such films.
Claims58
A coating composition comprising:
- TEOS;
- a surfactant;
- at least one organosilane;
- HCl;
- water;
- and
- ethanol.
A method for forming a film comprising:
- providing at least one coating composition comprising:
- TEOS;
- a surfactant;
- at least one organosilane;
- HCl;
- water;
- and
- ethanol;
- applying said coating composition on a substrate to form a coating on said substrate;
- and
- drying said coating to form a patterned silsequioxane film.
The method of 43, wherein providing said coating composition further comprises diluting said ethanol-diluted composition with water and HCl to provide an acidic sol.
The method of 21, wherein said at least one organosilane comprises (H5C2O)3SiCH2CH2Si(OC2H5)3 and said coating composition comprises Si:EtOH:H2O:HCl:surfactant in the ratio 1:22:5:0.004:(0.054-0.18).
Dependencies are inferred from the claim text.