Gas purification method
AssigneeNippon Sanso Corporation
InventorsMasato Kawai, Morimitsu Nakamura, Shigeo Tooyama
Life of this patent
Estimating the term…
Loading patent…
AssigneeNippon Sanso Corporation
InventorsMasato Kawai, Morimitsu Nakamura, Shigeo Tooyama
Estimating the term…
The present invention relates to a gas purification method for adsorbing and removing impurities by PSA method combined with heating, capable of removing water vapor and carbon dioxide in an economical and effective way. The present invention includes an adsorption step of adsorbing and removing water vapor first and then carbon dioxide by introducing the compressed feed gas into the adsorption column; a depressurization step of lowering the internal pressure of the adsorption column down to atmospheric pressure after the adsorption step; a heating step of heating and regenerating an adsorbent by introducing a purge gas not containing the impurities into the adsorption column after the depressurization step; and a repressurization step of elevating pressure by introducing a gas not containing the impurities into the adsorption column after the heating step; wherein the period of time of the adsorption step, the depressurization step plus the heating step and the repressurization step are set to be within the range of 10 to 40 min respectively.
A gas purification method for obtaining a purified gas by passing a feed gas containing water vapor and carbon dioxide as impurities through a plurality of adsorption columns which are packed with an adsorbent adsorbing the impurities and can be used switchably, and thus removing the impurities, the method comprising the steps of:
Dependencies are inferred from the claim text.