Film coated optical lithography elements and method of making
AssigneeCorning Incorporated
InventorsRobert L. Maier, Lisa A. Moore, Charlene M. Smith
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Abstract
The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.
Claims45
A method of making an optical lithography element for manipulating ultraviolet light said method comprising:
- providing a fluoride crystal optical element with an optical surface;
- providing a silicon oxyhalide film preform precursor;
- forming an optical coating on said optical surface, said optical coating formed on said optical surface from said provided silicon oxyhalide film preform.
A method of making an optical element for manipulating below 250 nm light, said method comprising:
- providing a fluoride crystal optical element with an optical surface for manipulating below 250 nm photons;
- providing a silicon oxyfluoride glass;
- vaporizing said provided silicon oxyfluoride glass,
- depositing said vaporized silicon oxyfluoride glass on said optical surface.
Dependencies are inferred from the claim text.