Method and apparatus for data stackification for run-to-run control
AssigneeAdvanced Micro Devices, Inc.
InventorsChristopher A. Bone, Anthony J. Toprac
Life of this patent
Estimating the term…
Abstract
In one embodiment, a method and apparatus is provided for data stackification for run-to-run control. A process run of semiconductor devices is processed. A manufacturing tag associated with the process run of semiconductor devices is recorded. Metrology data relating to the processed semiconductor devices is then acquired. The present invention calls for performing a metrology data stackification process upon the metrology data using the manufacturing tag for organizing and stacking the metrology data. The present invention provides for modifying at least one control parameter based upon the stacked metrology data.
Claims31
A method, comprising:
- performing at least one process run of semiconductor devices;
- recording at least one manufacturing tag associated with said process run of semiconductor devices;
- performing metrology upon at least one said process run of semiconductor device for acquiring metrology data;
- performing a metrology data stackification process upon said metrology data using said manufacturing tag for organizing and stacking said metrology data;
- and
- modifying at least one control parameter based upon said stacked metrology data.
An apparatus, comprising:
- a processing tool for processing a production run of semiconductor wafers;
- a metrology tool coupled with said processing tool and being capable of acquiring metrology data relating to said processed semiconductor wafers;
- a metrology data stacking unit coupled with said metrology tool and being capable of stacking said metrology data;
- a computer system coupled with said metrology data stacking unit and being capable of controlling directing and storing metrology data bi-directionally to and from said metrology data stacking unit;
- a control parameter filter unit coupled with said computer system and being capable of filtering data from said metrology data stacking unit;
- and
- a manufacturing model coupled with said computer system and said processing tool, said manufacturing model being capable of modifying control parameters in response to said filtering data from said metrology data stacking unit, for controlling said processing tool.
A system, comprising:
- means for performing at least one process run of semiconductor devices;
- means for recording a time stamp associated with said process run of semiconductor devices;
- means for recording a lot number associated with said process run of semiconductor devices;
- means for performing metrology upon at least one said process run of semiconductor device for acquiring metrology data;
- means for performing a metrology data stackification process upon said metrology data using said recorded time stamp and said lot number for organizing and stacking said metrology data;
- and
- means for modifying at least one control parameter based upon said stacked metrology data.
A computer readable program storage device encoded with instructions that, when executed by a computer, performs a method, comprising:
- performing at least one process run of semiconductor devices;
- recording at least one manufacturing tag associated with said process run of semiconductor devices;
- performing metrology upon at least one said process run of semiconductor device for acquiring metrology data;
- performing a metrology data stackification process upon said metrology data using said manufacturing tag for organizing and stacking said metrology data;
- and
- modifying at least one control parameter based upon said stacked metrology data.
Dependencies are inferred from the claim text.