Silicone polymer insulation film on semiconductor substrate and method for forming the film
AssigneeASM Japan K.K.
InventorNobuo Matsuki
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Abstract
A siloxan polymer insulation film has a dielectric constant of 3.3 or lower and has —SiR2O— repeating structural units. The siloxan polymer has dielectric constant, high thermal stability and high humidity-resistance on a semiconductor substrate. The siloxan polymer is formed by directly vaporizing a silicon-containing hydrocarbon compound expressed by the general formula SiαOβCxHy (α, β, x, and y are integers) and then introducing the vaporized compound to the reaction chamber of the plasma CVD apparatus. The residence time of the source gas is lengthened by reducing the total flow of the reaction gas, in such a way as to form a siloxan polymer film having a micropore porous structure with low dielectric constant.
Claims18
A method for forming a siloxan polymer insulation film on a semiconductor substrate by plasma treatment, comprising the steps of:
- vaporizing a silicon-containing hydrocarbon compound to produce a material gas for silicone polymer, said silicon-containing hydrocarbon having the formula SiαOα−1R2α−β+2(OCnH2n+1)β wherein α is an integer of 1-3, β is 0, 1, or 2, n is an integer of 1-3, and R is C1-6 hydrocarbon attached to Si;
- introducing the material gas into a reaction chamber for plasma CVD processing wherein a semiconductor substrate is placed;
- introducing an additive gas comprising an inert gas and optionally an oxidizing gas, said oxidizing gas being used in an amount less than the material gas;
- and
- forming a siloxan polymer film having —SiR2O— repeating structural units on the semiconductor substrate by activating plasma polymerization reaction in the reaction chamber where a reaction gas composed of the material gas and the additive gas is present, while controlling the flow of the reaction gas to lengthen a residence time, Rt, of the reaction gas in the reaction chamber, wherein 100 msec≦Rt,
- Rt[s]=9.42×107(Pr·Ts/Ps·Tr)rw2d/F
- wherein:
- Pr:
- reaction chamber pressure (Pa)
- Ps:
- standard atmospheric pressure (Pa)
- Tr:
- average temperature of the reaction gas (K)
- Ts:
- standard temperature (K)
- rw:
- radius of the silicon substrate (m)
- d:
- space between the silicon substrate and the upper electrode (m)
- F:
- total flow volume of the reaction gas (sccm).
A method for forming a siloxan polymer insulation film on a semiconductor substrate by plasma treatment, comprising the steps of:
- vaporizing a silicon-containing hydrocarbon compound to produce a material gas for silicone polymer, said silicon-containing hydrocarbon having the formula SiαOα−1R2α−β+2(OCnH2n+1)β wherein α is an integer of 1-3, β is 0 or 1, n is an integer of 1-3, and R is C1-6 hydrocarbon attached to Si;
- introducing the material gas into a reaction chamber for plasma CVD processing wherein a semiconductor substrate is placed;
- introducing an additive gas comprising an inert gas and an oxidizing gas, said oxidizing gas being used in an amount less than the material gas;
- and
- forming a siloxan polymer film having —SiR2O— repeating structural units on the semiconductor substrate by activating plasma polymerization reaction in the reaction chamber where a reaction gas composed of the material gas and the additive gas is present, while controlling the flow of the reaction gas to lengthen a residence time, Rt, of the reaction gas in the reaction chamber, wherein 100 msec≦Rt,
- Rt[s]=9.42×107(Pr·Ts/Ps·Tr)rw2d/F
- wherein:
- Pr:
- reaction chamber pressure (Pa)
- Ps:
- standard atmospheric pressure (Pa)
- Tr:
- average temperature of the reaction gas (K)
- Ts:
- standard temperature (K)
- rw:
- radius of the silicon substrate (m)
- d:
- space between the silicon substrate and the upper electrode (m)
- F:
- total flow volume of the reaction gas (sccm).
A method for forming a siloxan polymer insulation film on a semiconductor substrate by plasma treatment, comprising the steps of:
- vaporizing a silicon-containing hydrocarbon compound to produce a material gas for silicone polymer, said silicon-containing hydrocarbon having the general formula SiαOβCxHy wherein α,β,x, and y are integers;
- introducing the material gas into a reaction chamber for plasma CVB processing wherein a semiconductor substrate is placed;
- introducing an additive gas;
- and
- forming a siloxan polymer film having −SiR2O− repeatin structural units on the semiconductor substrate by activating plasma polymerization in the reaction chamber where a reaction gas composed of the material gas and the additive gas is present, while controlling the flow of the reaction gas to lenghthen a residence time, Rt, of the reaction gas in the reaction chamber, wherein 100 msec≦Rt,
- Rt=9.42×107(Pr.Ts/Ps.Tr)rw2d/f
- wherein:
- Pr:
- reaction chamber pressure (Pa)
- Ps:
- standard atmospheric pressure (Pa)
- Tr:
- average temperature of the reaction gas (K)
- Ts:
- standard temperature (K)
- rw:
- radius of the silicon substrate (m)
- d:
- space between the silicon substrate and the upper electrode (m)
- F:
- total flow volume of the reaction gas (sccm).
Dependencies are inferred from the claim text.