Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same
AssigneeHyundai Electronics Industries Co., Ltd.
InventorsKeun Kyu Kong, Jae Chang Jung, Geun Su Lee, Ki Ho Baik
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Abstract
The present invention provides novel photoresist monomers, and photoresist polymers derived from monomers comprising the same. The photoresist monomers of the present invention are represented by the following formula: where Z1, Z2, R1, R2, R3, R4, R5 and p are those defined herein. The photoresist compositions comprising the photoresist polymers of the present invention have excellent etching resistance and heat resistance, and remarkably enhanced PED stability (post exposure delay stability).
Claims22
A photoresist polymer derived from a monomer comprising a compound of the formula:
- wherein
- each of Z1 and Z2 is independently CH2, CH2CH2, O or S;
- each of R1 and R2 is independently substituted or unsubstituted (C1-C5) straight or branched chain alkyl;
- each of R3 and R4 is independently hydrogen, or substituted or unsubstituted (C1-C5) straight or branched chain alkyl;
- R5 is hydrogen or methyl;
- and
- p is an integer from 0 to 5, and
- a compound of the formula:
- wherein
- each of Y1 and Y2 is independently CH2, CH2CH2, O or S;
- R6 is hydrogen or methyl;
- R8 is hydrogen, or substituted or unsubstituted (C1-C5) straight or branched chain alkyl;
- R10 is substituted or unsubstituted (C1-C5) straight or branched chain alkylene;
- and
- q is an integer from 0 to 5.
Dependencies are inferred from the claim text.