Optical semiconductor module, its manufacture, reflection film, its manufacture, and laser and optical devices using reflection film

An optical semiconductor module comprising:

• a platform having a support surface;
• an optical semiconductor element disposed on the support surface of said platform;
• an optical element disposed on the support surface of said platform and having an optical coupling facet, said optical element being optically coupled to said optical semiconductor element at the optical coupling facet;
• a protective member made of insulating resin covering said optical semiconductor element, and being disposed at least in a light transmission area in a space between said semiconductor element and the optical coupling facet of said optical element;
• and
• a shielding member made of conductive resin and covering a surface of said protective member.

A laser device comprising:

• a laser medium having an oscillation wavelength λ and two reflection facets and defining an optical resonator;
• a lamination structure formed on at least one reflection facet of the optical resonator defined by said laser medium, said lamination structure being formed by laminating k (k is a positive integer) pairs of a first layer having a refractive index n1 and a second layer having a refractive index n2 wherein a thickness of the first layer is:
• (λ/4+(λ/2)×N1)/n1
• where N1 is 0 or a positive integer, and a thickness of the second layer is:
• (λ/4+(λ/2)×N2)/n2
• where N2 is 0 or a positive integer;
• a third layer having the refractive index n1 formed on the second layer at the k-th pair of said lamination structure;
• and
• a protective member made of a material having a refractive index ns and covering a surface of said third layer,
• wherein if the thickness d3 of said third layer is:
• d3=d+(λ/2n1)×N3
• where N3 is 0 or a positive integer, then:
• cos 2 ⁢ Δ = n 1 2 ns ⁢ n 1 2 ⁢ a 4 - n 0 2 ( 1 + n 1 2 ns ) ⁢ ( n 1 2 ⁢ a 4 - n 0 2 ) Δ = 2 ⁢ ⁢ π ⁢ ⁢ n 1 ⁢ d λ , ⁢ a = ( n 1 n 2 ) k ⁢ ⁢ (k is 0 or a positive integer.)
• is satisfied.

An optical device comprising:

• an optical medium having a refractive index n0 and a defined reflection facet;
• a lamination structure formed on the reflection facet of said optical medium, said lamination structure being formed by laminating k (k is a positive integer) pairs of a first layer having a refractive index n1 and a second layer having a refractive index n2 wherein optical thicknesses of the first layer and the second layer-relative to light having a wavelength λ are both:
• λ/4+(λ/2)×N
• where N is 0 or a positive integer;
• a third layer having the refractive index n1 and formed on the second layer at the k-th pair of said lamination structure;
• and
• a protective film made of a material having a refractive index ns and covering a surface of said third layer,
• wherein if the thickness d3 of said third layer is:
• d3=d+(λ/2n1)×N
• where N is 0 or a positive integer, then:
• cos 2 ⁢ Δ = n 1 2 ns ⁢ n 1 2 ⁢ a 4 - n 0 2 ( 1 + n 1 2 ns ) ⁢ ( n 1 2 ⁢ a 4 - n 0 2 ) Δ = 2 ⁢ ⁢ π ⁢ ⁢ n 1 ⁢ d λ , ⁢ a = ( n 1 n 2 ) k ⁢ ⁢ (k is 0 or a positive integer.)
• is satisfied.

An optical device comprising:

• an optical medium having a refractive index n0 and a defined reflection facet;
• a lamination structure formed on the reflection facet of said optical medium, said lamination structure being formed by laminating k (k is a positive integer) pairs of a first layer having a refractive index n1 and a second layer having a refractive index n2 wherein optical thicknesses of the first layer and the second layer relative to light having a wavelength λ are both:
• λ/4+(λ/2)×N
• where N is 0 or a positive integer;
• and
• a third layer having the refractive index n1 and formed on the second layer at the k-th pair of said lamination structure,
• wherein if the thickness d3 of said third layer is:
• d3=d+(λ/2n1)×N
• where N is 0 or a positive integer, then:
• arccos ⁡ ( n 1 2 16 ⁢ n 1 2 ⁢ a 4 - n 0 2 ( 1 + n 1 2 16 ) ⁢ ( n 1 2 ⁢ a 4 - n 0 2 ) ) × λ 2 ⁢ ⁢ π ⁢ ⁢ n 1 ≤ d ≤ arccos ⁡ ( n 1 2 ⁢ n 1 2 ⁢ a 4 - n 0 2 ( 1 + n 1 2 ) ⁢ ( n 1 2 ⁢ a 4 - n 0 2 ) ) × λ 2 ⁢ ⁢ π ⁢ ⁢ n 1 or arccos ⁡ ( - n 1 2 ⁢ n 1 2 ⁢ a 4 - n 0 2 ( 1 + n 1 2 ) ⁢ ( n 1 2 ⁢ a 4 - n 0 2 ) ) × λ 2 ⁢ ⁢ π ⁢ ⁢ n 1 ≤ d ≤ arccos ⁡ ( - n 1 2 16 ⁢ n 1 2 ⁢ a 4 - n 0 2 ( 1 + n 1 2 16 ) ⁢ ( n 1 2 ⁢ a 4 - n 0 2 ) ) × λ 2 ⁢ ⁢ π ⁢ ⁢ n 1 a = ( n 1 n 2 ) k
• is satisfied.

A laser device comprising:

• a laser medium having an oscillation wavelength λ [nm], an effective refractive index n0 and two reflection facets defining an optical resonator;
• a first layer formed on at least one reflection facet of said laser medium, made of silicon oxide and having a thickness d1 [nm];
• a second layer formed on a surface of said first layer, made of silicon having a refractive index nsi and having a thickness d2 [nm];
• a third layer formed on a surface of said second layer, made of silicon oxide having a thickness d3 [nm];
• wherein the effective refractive index n0 is in a range from 3.18 to 3.28, the thickness d1 is in a range of:
• (0.11−9.2×10−3R+2.2×10−4R2)λ/1.45±15,
• the thickness d2 is in a range of:
• (−8.7×10−3+3.5×10−3R−1.2×10−5R2)×(−3.6+17/nsi)λ±15,
• and the thickness d3 is in a range of:
• (0.23−4.9×10−3R+7.7×10−5R2)λ/1.45±15,
• and R [%] is in a range from 15 to 30.

A laser device comprising:

• a laser medium having an oscillation wavelength λ [nm], an effective refractive index n0 and two reflection facets defining an optical resonator;
• a first layer formed on at least one reflection facet of said laser medium, made of aluminum oxide and having a thickness d1 [nm];
• a second layer formed on a surface of said first layer, made of silicon having a refractive index nsi and having a thickness d2 [nm];
• a third layer formed on a surface of said second layer, made of aluminum oxide having a thickness d3 [nm];
• wherein the effective refractive index n0 is in a range from 3.18 to 3.28, the thickness d1 is in a range of:
• (1.7×10−3+1.1×10−3R+3.1×10−5R2)λ/1.72±15,
• the thickness d2 is in a range of:
• (2.3×10−2+3.5×10−3R−5.6×10−5R2)×(−1.4+8.9/nsi)λ±15,
• and the thickness d3 is in a range of:
• (0.21−1.9×10−3R+2.1×10−5R2)λ/1.72±15,
• and R [%] is in a range from 15 to 30.

A laser device comprising:

• a laser medium having an oscillation wavelength λ [nm], an effective refractive index n0 and two reflection facets defining an optical resonator;
• a first layer formed on at least one reflection facet of said laser medium, made of silicon oxide and having a thickness d1 [nm];
• a second layer formed on a surface of said first layer, made of silicon having a refractive index nsi and having a thickness d2 [nm];
• a third layer formed on a surface of said second layer, made of aluminum oxide having a thickness d3 [nm];
• wherein the effective refractive index n0 is in a range from 3.18 to 3.28, the thickness d1 is in a range of:
• (−3.1×10−5+3.6×10−3R−3.5×10−5R2)λ/1.45±15,
• the thickness d2 is in a range of:
• (3.5×10−2+2.5×10−3R−3.6×10−5R2)×(−2.6+1.4/nsi)λ±15,
• and the thickness d3 is in a range of:
• (0.21−1.9×10−3R+2.1×10−5R2)λ/1.72±15,
• and R [%] is in a range from 15 to 30.

A laser device comprising:

• a laser medium having an oscillation wavelength λ [nm], an effective refractive index n0 and two reflection facets defining an optical resonator;
• a first layer formed on at least one reflection facet of said laser medium, made of aluminum oxide and having a thickness d1 [nm];
• a second layer formed on a surface of said first layer, made of silicon having a refractive index nsi and having a thickness d2 [nm];
• a third layer formed on a surface of said second layer, made of silicon oxide having a thickness d3 [nm];
• wherein the effective refractive index n0 is in a range from 3.18 or larger to 3.28 of smaller, the thickness d1 is in a range of:
• (0.12−1.2×10−2R+3.2×10−4R2)λ/1.72±15,
• the thickness d2 is in a range of:
• (−2.7×10−2+3.4×10−3R+2.4×10−5R2)×(−3.8+2.8/nsi)λ±15,
• and the thickness d3 is in a range of:
• (0.23−4.9×10−3R+7.7×10−5R2)λ/1.45±15,
• and R [%] is in a range from 15 to 30.