Dip cleaning system for a substrate, system for evaluating the amount of particles and method of evaluating the amount of particles adhering to a substrate

Abstract

There are provided an system for evaluating the amount of particles, a dip cleaning system, and a method of evaluating the amount of particles adhering to a substrate, which enable high-precision quantitative evaluation of the amount of particles suspended in a liquid without use of a monitor substrate, which enable easy determination of the correlation between the amount of particles suspended in the liquid and the amount of particles adhering to the substrate which is an object of cleaning, and which enable low-cost and highly-reliable cleaning evaluation. A residual liquid recovery pan for recovering a residual liquid interposed and a residual liquid quantitative measurement bath for measuring the amount of submerged particles is interposed, between the first substrate treatment bath and the second substrate treatment bath. A sample liquid is prepared by recovering a residual liquid dropped from the substrate by the residual liquid recovery pan and the residual liquid quantitative measurement bath when the substrate is transported from the first substrate treatment bath to the second substrate treatment bath through use of the substrate transportation structure. The sample liquid stored in the pure water metering bath is diluted with a predetermined amount of pure water by means of supplying pure water from the pure water supply source to the pure water metering bath. The amount of particles suspended in the thus-diluted sample liquid is measured through use of the submerged particle counter.

Dependencies are inferred from the claim text.