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US 6,444,760 B1Granted
Method of reducing the content of residual monomers in aqueous polymer dispersions
AssigneeBASF SE
InventorsRobert Rupaner, Gerhard Bauer, Sven Lawrenz, Claudia Heibel, Johannes Dobbelaar
Life of this patent
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Abstract
A process is described for effectively reducing the residual monomer content of an aqueous polymer dispersion by aftertreatment at atmospheric pressure or above with an initiator system comprising a) a hydroperoxide, hydrogen peroxide or a peracid, and b) an α-hydroxy carboxylic acid, such as tartaric acid, or with a salt thereof.
Claims10
A process for reducing the amount of residual monomer in an aqueous polymer dispersion prepared by free-radical polymerization, comprising:
- conducting an aftertreatment in the aqueous polymer dispersion which is heated to 60 to 120° C.;
- and
- adding of an initiator system which consists essentially of
- a) from 0.01 to 5% by weight, based on the overall amount of monomer used to prepare the polymer dispersion, of
- a1) a compound R1—OO—R2,
- where R1 and R2 are hydrogen, a C1-C8-alkyl or a C6-C12-aryl and are identical or different, with the proviso that at least one of R1 and R2 is hydrogen, and/or
- a2) a compound which in aqueous medium releases hydrogen peroxide, and
- b) from 0.01 to 30% by weight, based on the overall amount of monomer used to prepare the polymer dispersion, of an organic α-hydroxy carboxylic acid, which contains no polymerizable, olefinically unsaturated C—C double bond, or of a salt thereof, and
- c) from 10 to 1000 ppm by weight, based on the overall amount of monomer used to prepare the polymer dispersion, of a multivalent metal ion selected from the group consisting of an iron ion, a copper ion, a manganese ion, a nickel ion, a cerium ion, a chromium ion, a platinum ion and a palladium ion;
- wherein said initiator system contains no vanadium ions.
7 more elements
Dependencies are inferred from the claim text.