Low dielectric materials and methods of producing same
AssigneeHoneywell International Inc.
InventorsShyama Mukherjee, Roger Leung, Kreisler Lau
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AssigneeHoneywell International Inc.
InventorsShyama Mukherjee, Roger Leung, Kreisler Lau
Estimating the term…
In accordance with the present invention, compositions and methods are provided in which the mechanical strength and durability of a precursor material having a plurality of pores is increased by a) providing a precursor material; b) treating the precursor material to form a nanoporous aerogel, preferably by using a supercritical drying process; c) providing a blending material having a reinforcing component and a volatile component; d) combining the nanoporous aerogel and the blending material to form an amalgamation layer; and e) treating the amalgamation layer to increase the mechanical strength of the layer by a substantial amount, and to ultimately form a low dielectric material that can be utilized in various applications.
A dielectric material comprising:
Dependencies are inferred from the claim text.