Coating and developing method
AssigneeTokyo Electron Limited
InventorsShinichiro Araki, Shinko Matsumoto, Noriyuki Anai
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Abstract
A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.
Claims8
A method of forming a plurality of kinds of color resist films on a substrate, said method comprising the steps of:
- forming one of said plurality of kinds of color resist films on a substrate, the forming step including a step of coating the substrate with a color resist prepared for forming said one of said plurality of kinds of color resist films and a step of developing the color resist coated on the substrate;
- and
- repeating the forming step while changing the color resist to be fed onto the substrate, thereby forming said plurality of kinds of color resist films on the substrate,
- wherein each of the coating steps are carried out by using a common resist-coating unit, which is adapted to apply a plurality kind of color resists each prepared for forming said plurality of kinds of color resist films.
Dependencies are inferred from the claim text.