Method for forming photoresist pattern and manufacturing method of magnetoresistive effect thin-film magnetic head
AssigneeTDK Corporation
InventorsNoriyuki Ito, Koichi Terunuma, Satoshi Tsukiyama
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Abstract
A method for forming a photoresist pattern, includes a step of forming a photoresist pattern having a certain width, and a step of performing thereafter ion milling with respect to side walls of the formed photoresist pattern by using an ion beam with a large incident angle so as to reduce the width of the formed photoresist pattern.
Claims5
A method for forming a photoresist pattern, comprising the steps of:
- forming a photoresist pattern having a certain width;
- and
- thereafter, performing ion milling with respect to side walls of said formed photoresist pattern by using an ion beam with a large incident angle so as to reduce the width of said formed photoresist pattern, wherein said incident angle of the ion beam is an angle larger than 40 degrees and smaller than 90 degrees.
A manufacturing method of a magnetoresistive effect thin-film magnetic head, comprising the steps of:
- depositing a layer for forming magnetic domain control layers by using a photoresist pattern having a certain width;
- thereafter, performing ion milling with respect to side walls of said photoresist pattern by using an ion beam with a large incident angle so as to reduce the width of said photoresist pattern;
- and
- depositing a layer for forming lead conductor layers by using said photoresist pattern with the reduced width.
A maufacturing method of a magnetoresistive effect thin-film magnetic head, comprising the steps of:
- forming a photoresist pattern having a certain width on a magnetoresistive effect layer;
- performing ion milling with respect to said magnetoresistive effect layer by using said photoresist pattern to form a patterned magnetoresistive effect layer;
- depositing a layer for forming magnetic domain control layers by using said photoresist pattern;
- thereafter, performing ion milling with respect to side walls of said photoresist pattern by using an ion beam with a large incident angle so as to reduce the width of said photoresist pattern;
- and
- depositing a layer for forming lead conductor layers by using said photoresist pattern with the reduced width.
Dependencies are inferred from the claim text.