Ester compounds, polymers, resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTakeru Watanabe, Takeshi Kinsho, Tsunehiro Nishi, Mutsuo Nakashima, Koji Hasegawa, Jun Hatakeyama
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Abstract
A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
Claims19
A polymer comprising units of an ester compound of the following general formula (1a-1) or (1a-2):
- wherein R1 is hydrogen, methyl or CH2C2R4;
- R2 is hydrogen, methyl or C2R4;
- R3 is a straight, branched or cyclic alkyl group of 1 to 8 carbon atoms or a substituted or unsubstituted aryl group of 6 to 20 carbon atoms;
- R4 is a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms;
- k is equal to 0 or 1, m is equal to 0 or 1, n is equal to 0, 1, 2 or 3, and 2m+n is equal to 2 or 3,
- said polymer having a weight average molecular weight of 1,000 to 500,000.
A method for preparing a polymer comprising effecting radical polymerization, anionic polymerization or coordination polymerization between an ester compound of formula (1) and another compound having a carbon-to-carbon double bond.
Dependencies are inferred from the claim text.