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AssigneesTokyo Magnetic Printing Co., Ltd., TDK Corporation
InventorsKazuya Orii, Tetsuyuki Itakura, Masahiro Sasaki, Yasutoshi Fujita, Masao Yamaguchi
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This invention relates to free abrasive slurries suited for use in polishing workpieces composed of materials varying in hardness, uniformly without selective polishing or working without difference in the amounts of polishing for different materials. The subject matter of this invention is a free abrasive slurry composition for polishing workpieces in which at least one soft material with a Vickers hardness in the range of 26 to 360 and at least one hard material with a Vickers hardness in the range of 700 to 4000 are mixedly present, comprising a polyol with a molecular weight ranging from 300 to 20000, a polishing powder, a dispersion medium, and optionally a surfactant.
In the manufacture of thin film magnetic heads having at least one soft material having a Vickers hardness in the range of 26 to 360 and at least one hard material having a Vickers hardness in the range of 700 to 4000, including a process for polishing, without causing substantial selective abrasion, the surface of each said head that serves as an air bearing surface, a polishing method which comprises the use of a free abrasive slurry composition comprising a polyol with a molecular weight ranging from 300 to 20,000, a polishing powder, a non-polar organic solvent as dispersion medium, said polyol being polyether obtained by addition reaction of propylene oxide or propylene oxide and ethylene oxide, the polyol having 1-6 hydroxyl groups.
Dependencies are inferred from the claim text.