Back to results
US 6,444,105 B1Granted
Physical vapor deposition reactor including magnet to control flow of ions
AssigneeNovellus Systems, Inc.
InventorsKwok F. Lai, Andrew L. Nordquist, Kaihan A. Ashtiani, Larry D. Hartsough, Karl B. Levy
Life of this patent
Estimating the term…
Abstract
A novel hollow cathode magnetron source is disclosed. The source comprises a hollow cathode with a non-planar target. By using a magnet between the cathode and a substrate, plasma can be controlled to achieve high ionization levels, good step coverage, and good process uniformity.
Claims23
A physical vapor deposition reactor comprising:
- a cup-shaped target having a central axis;
- a substrate positioned such that said axis intersects said substrate;
- an annular first magnet surrounding said target and said axis;
- and
- an annular second magnet, positioned around said axis and between said target and said substrate, which is used to control the shape of a separatrix generated by the first magnet.
2 more elements
A magnetron physical vapor deposition reactor comprising:
- a cup-shaped target having a central axis, said target surrounding a first segment of said central axis;
- a substrate positioned such that said substrate intersects a second segment of said axis;
- an annular first magnet surrounding said target and said axis;
- and
- an annular second magnet positioned around a third segment of said axis, said third segment of said axis being located between said first and second segments of said axis, wherein the second magnet serves to spread or focus plasma streaming onto the substrate.
2 more elements
A physical vapor deposition reactor comprising:
- a cup-shaped target having a central axis;
- a substrate positioned such that said axis intersects said substrate;
- an annular first magnet surrounding said target and said axis, wherein the first magnet comprises a magnet stack having poles oriented substantially parallel with said axis;
- and
- an annular second magnet positioned around said axis and between said target and said substrate.
2 more elements
Dependencies are inferred from the claim text.