Carrier head with layer of conformable material for a chemical mechanical polishing system
AssigneeApplied Materials, Inc.
InventorsRobert D. Tolles, Tsungan Cheng, John Prince
Life of this patent
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Abstract
A carrier head for a chemical mechanical polishing apparatus. A layer of conformable material is disposed in a recess of the carrier head to provide a mounting surface for a substrate. The conformable material may be elastic and undergo normal strain in response to an applied load. The carrier head may also include a support fixture detachably connected to a backing fixture, a retaining ring connected directly to the conformable material, and a shield ring which projects over a portion of the layer of conformable material.
Claims4
A carrier head for a chemical mechanical polishing apparatus, comprising:
- a housing;
- a rigid backing fixture movably connected to the housing by a flexible member, a volume between the housing and backing fixture providing a pressurizable chamber, the backing fixture having a surface located on a side of the flexible member opposite the chamber;
- and
- a module having a rigid support fixture detachably connected to and abbutting the surface of the backing fixture, the support fixture being detachable from the backing fixture and including a recess formed therein and a layer of conformable material disposed in the recess to provide a mounting surface for a substrate.
Dependencies are inferred from the claim text.