Electron beam apparatus using electron source, spacers having high-resistance film and low-resistance layer, and image-forming device using the same
AssigneeCanon Kabushiki Kaisha
InventorsYoichi Ando, Hideaki Mitsutake
Life of this patent
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Abstract
This invention provides an arrangement for alleviating the electric charge of members apt to be electrically charged such as spacers used in an electron beam apparatus by arranging a high resistance film thereon. Particularly, the low resistance layer arranged at each of the members is covered by a high resistance film to suppress any electric discharges.
Claims58
An electron beam apparatus comprising an electron source having electron beam emitting devices, an electrode for controlling electrons emitted from said electron source and members arranged between said electron source and said electrode, wherein
- said members have:
- a high resistance film formed on a surface thereof;
- and
- at least a low resistance layer formed on the side facing said electrode or said electron source;
- said high resistance film being electrically connected to either said electrode or said electron source by way of said low resistance layer, wherein said low resistance layer is arranged on the end face of said members facing either said electrode or said electron source and extending to the lateral sides thereof and the extended portion of said low resistance layer is covered by said high resistance film at least at the extreme ends thereof.
An electron beam apparatus comprising an electron source having electron beam emitting devices, an electrode separated from said electron source and members arranged between said electron source and said electrode, wherein
- said members include:
- a film arranged on a surface thereof and adapted to allow a minute electric current to flow therethrough;
- and
- an end electrode arranged at least at the end facing said electron source or said electrode, wherein said end electrode is arranged on the end face of said members facing either said electrode or said electron source and extending to the lateral sides thereof and the extended portion of said end electrode is covered by said film at least at the extreme ends thereof.
An electron beam apparatus comprising an electron source having electron beam emitting devices, and electrode for controlling electrons emitted from said electron source and members arranged between said electron source and said electrode, wherein
- said members have:
- a high resistance film formed on a surface thereof;
- and
- at least a low resistance layer formed on the side facing said electrode or said electron source;
- said high resistance film being electrically connected to either said electrode or said electron source by way of said low resistance layer, wherein said high resistance film may be arranged to cover said low resistance layer at least on the end face facing said electrode or said electron source.
An electron beam apparatus comprising an electron source having electron beam emitting devices, an electrode separated from said electron source and members arranged between said electron source and said electrode, wherein
- said members include:
- a film arranged on a surface thereof and adapted to allow a minute electric current to flow therethrough;
- and
- an end electrode arranged at least at the end facing said electron source or said electrode, wherein said film is arranged to cover said end electrode at least on the end face facing said electrode or said electron source.
Dependencies are inferred from the claim text.