Physical vapor deposition apparatus with modified shutter disk and cover ring

A method of using a physical vapor deposition (PVD) apparatus for tabbed block-out scheme, the PVD device comprising a chamber;

• an upper shield and a lower shield mounted within the chamber;
• a cover ring having one or more tabs extending radially inwardly therefrom;
• a wafer pedestal mounted within the chamber beneath the lower shield;
• means for positioning a shutter disk to place the shutter disk on the wafer pedestal;
• and means for vertically adjusting the height of wafer pedestal, the method comprising:
• forming notched areas in the periphery of the shutter disk complementary to the one or more tabs of the cover ring to keep a distance between the tab and the shutter disk;
• placing the shutter disk on a wafer pedestal;
• moving the shutter disk into a pasting position on the wafer pedestal, the notched areas of the shutter disk corresponding with the tab for alignment therebetween such that pasting can be performed in the chamber;
• and
• performing a pasting process with the shutter disk on the pasting position.