Method for fabricating a thin film transistor display

A method of fabricating a thin film transistor display, the thin film transistor display being fabricated on a substrate, the substrate comprising a first region and a second region, the first region comprising a transistor area for forming at least one transistor, the second region comprising a pad area for forming at least one pad, the first region further comprising a first side area, the method comprising the steps of:

• (1) depositing a first metal layer on the substrate;
• (2) patterning the first metal layer to form a gate electrode in the transistor area and a pad electrode in the pad area;
• (3) sequentially forming an insulating layer, a semiconductor layer, and a doped silicon layer on the substrate;
• (4) defining an opening area in the pad area, and removing the insulating layer, the semiconductor layer, and the doped silicon layer positioned (a) except the transistor area of the first region, (b) except the pad area of the second region, and (c) within the opening area of the second region, an opening being formed in the pad area, the pad electrode being exposed in the opening, and the substrate thus being exposed in areas outside the transistor area and the pad area;
• (5) depositing a second metal layer on the substrate to cover the transistor area and the pad area, and the second metal layer in the opening being electrically connecting to the pad electrode;
• and
• (6) patterning the second metal layer, defining a channel area in the transistor area, and first removing the second metal layer positioned (a) outside the first side area of the first region, (b) in the channel area of the first region, and (c) in the second region except the pad area, then patterning the doped silicon layer by utilizing the left second metal layer as a mask to form source/drain electrodes in the transistor area, the source and the drain electrodes being separated by the channel area, the substrate being exposed in the first side area of the first region and exposed in the second region except the pad area.