Method of making inkjet print head with patterned photoresist layer having features with high aspect ratios
AssigneeXerox Corporation
InventorsMildred Calistri-Yeh, Cathie J. Burke, Diane Atkinson
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Abstract
Patterned photoresist layers formed on substrates have features with high aspect ratios. The photoresist layers can be formed as single layers with aspect ratios as high as about 4:1. In addition, the features in the photoresist layers can have a wide range of aspect ratios in a given single layer. The photoresist layers can be used in ink jet print heads and other devices to provide controlled fluid flow. The photoresist layers are formed using a contrast enhancement material that enables features having substantially vertical side walls and high aspect ratios to be formed.
Claims17
A method of making an inkjet print head, comprising:
- applying a polymeric resist material over a substrate;
- forming a single permanent patterned layer, having a plurality of features, in the polymeric resist material;
- and
- forming a plurality of ink passages using the plurality of features, wherein:
- each of the features of the plurality of features has a height and a width, and the plurality of features includes at least two features having different aspect ratios from each other, and at least one feature having an aspect ratio of at least about 2:1.
Dependencies are inferred from the claim text.