Low “K” factor hybrid photoresist
AssigneeInternational Business Machines Corporation
InventorsSteven J. Holmes, Ahmad D. Katnani, Niranjan M. Patel, Paul A. Rabidoux
Life of this patent
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Abstract
A photoresist having both positive and negative tone components resulting in a lower “k” factor than the single tone photoresist is disclosed. The hybrid resist may either have the negative tone resist or the positive tone resist as the major portion, while the other tone is a relatively minor portion. For examples, a positive tone resist may include a minor portion of a negative tone cross-linker or a negative tone resist may include positively acting functional groups. The hybrid resist of the present invention allows for wider exposure dosage windows, therefore increasing the yield or performance and line density.
Claims8
A composition comprising:
- a positive tone photoresist material having an aqueous base soluble organic portion wherein the aqueous base soluble organic portion is partially protected with acid labile moieties as protective groups, wherein the degree of protection is sufficient to render the composition initially insoluble in aqueous base and may be de-blocked to increase solubility;
- and
- a glycoluril cross-linker, wherein a percent by weight based on the organic portion is less than about 1.0, and wherein the composition is rendered aqueous base soluble after the single excitation event even though the solubility of the exposed composition is reduced by the amount of glycoluril cross-linker.
A composition comprising:
- a) 84 to 99 weight percent total solids of a positive tone photoresist material having an aqueous base soluble organic portion wherein the aqueous base soluble organic portion is partially protected with acid labile moieties as protective groups, wherein the degree of protection is sufficient to render the composition initially insoluble in aqueous base and may be de-blocked to increase solubility upon exposure to acid;
- b) 0.1 to about 1.0 weight percent total solids of a glycoluril crosslinker;
- and
- c) 1 to 15 weight percent total solids of a photoacid generator, wherein the composition is rendered aqueous base soluble after a single excitation event.
Dependencies are inferred from the claim text.