Brazing structure and metallized structure
AssigneesJapan Science and Technology Corporation, Kabushiki Kaisha Toshiba
InventorsMasahiro Nomura, Chihiro Iwamoto, Shun-Ichiro Tanaka
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AssigneesJapan Science and Technology Corporation, Kabushiki Kaisha Toshiba
InventorsMasahiro Nomura, Chihiro Iwamoto, Shun-Ichiro Tanaka
Estimating the term…
A structure comprising silicon-containing ceramic body and an active metal-containing metal layer as a brazing layer or a metallization layer bonded to and disposed on the surface of the ceramic body. A reaction layer of a compound containing constituent elements of the ceramic body and the active metal is formed in the interface between the ceramic body and the metal layer. The reaction layer is present ahead the outer circular edge of the metal layer. In particular, when the ceramic body is silicon nitride with the active metal being titanium, the reaction layer comprises a first reaction layer composed mainly of titanium nitride and a second reaction layer composed mainly of titanium silicide. The first reaction layer is present ahead the outer circular edge of the second reaction layer. According to the brazed structure and the metallized structure, the characteristics of the metal layer containing the active metal, such as bonding strength, can be improved with good reproducibility.
A brazed structure, comprising:
A metallized structure, comprising:
Dependencies are inferred from the claim text.