Vacuum processing apparatus and vacuum processing method

A vacuum processing method for evacuating the inside of a vacuum vessel provided with a substrate therein, by evacuation means, introducing a gas into the vacuum vessel by gas supply means and applying high-frequency power thereto by a high-frequency power source, thereby generating a plasma, wherein the evacuation means comprises a first evacuation means and a second evacuation means, comprising the steps of:

• connecting the vacuum vessel to the first evacuation means to evacuate the vacuum vessel to a vacuum;
• disengaging and moving the vacuum vessel from the first evacuation means while maintaining a vacuum in the vacuum vessel;
• connecting the vacuum vessel with the second evacuation means for evacuating the inside of the vacuum vessel, the starting material gas supply means, and the high-frequency power source;
• and
• disconnecting the vacuum vessel from the second evacuation means, the gas supply means, and the high-frequency power source.

A vacuum processing apparatus comprising:

• a vacuum vessel capable of holding a substrate therein;
• evacuation means for evacuating the vacuum vessel;
• gas supply means for introducing a gas into the vacuum vessel;
• a high-frequency power source for applying high frequency power to at least one electrode, thereby generating a plasma;
• and
• a plurality of connection mechanisms capable of detachably connecting the vacuum vessel to each of the evacuation means, the high frequency power sources and the gas supply means;
• wherein the connection mechanism between the vacuum vessel and the gas supply means comprises a supply pipe for supplying starting material gas and an external pipe for separating the supply pipe from the atmosphere and wherein the interior of the external pipe can be evacuated.

A vacuum processing apparatus comprising:

• a vacuum vessel provided with a substrate therein;
• evacuation means for evacuating the vacuum vessel;
• gas supply means for introducing a gas into the vacuum vessel;
• high frequency power supply means for generating plasma;
• and
• a plurality of connection mechanisms capable of detachably connecting the vacuum vessel to each of the evacuation means, the gas supply means and the high frequency power supply means;
• wherein the connection mechanism for connecting the vacuum vessel to the evacuation means and the connection mechanism for connecting the gas supply means are integrally formed;
• wherein the connection mechanism for connecting the vacuum vessel to the gas supply means is formed in an evacuation pipe which evacuates the vacuum vessel and which is formed by the connection mechanism for connecting the vacuum vessel to the evacuation means;
• wherein the evacuation means comprises a first evacuation means and a second evacuation means;
• and
• wherein the vacuum vessel is capable of being moved between the first and second evacuation means while maintaining vacuum.