Substrate processing method and apparatus
AssigneeEbara Corporation
InventorHiroyuki Shinozaki
Life of this patent
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Abstract
A substrate processing method and apparatus capable of uniformly supplying a processing liquid to a substrate surface in substrate processing such as development processing without exerting an influence on the physical properties of the processing liquid and without damaging the substrate. A rotating blade is disposed above the horizontally placed substrate so as to face the substrate. The processing liquid is supplied to the surface of the substrate, and the rotating blade is rotated while being kept out of contact with the processing liquid to induce a gas current. The gas current forms a mass of processing liquid having an internal circulating current on the substrate surface below the rotating blade.
Claims6
A substrate processing method for processing a surface of a substrate with a processing liquid, said substrate processing method comprising the steps of;
- disposing a rotating blade above the horizontally placed substrate so as to face said substrate;
- supplying the processing liquid to the surface of said substrate;
- and
- rotating said rotating blade while keeping it out of contact with said processing liquid to induce a gas current over said processing liquid, so that said gas current forms from said processing liquid a mass of processing liquid having an internal circulating current on the surface of said substrate.
A substrate processing apparatus for processing a surface of a substrate with a processing liquid, said substrate processing apparatus comprising:
- a rotating blade disposed above the horizontally placed substrate so as to face said substrate;
- means for supplying the processing liquid to the surface of said substrate;
- and
- means for rotating said rotating blade while keeping it out of contact with said processing liquid,
- said rotating blade is being so configured, spaced apart from said surface of said substrate and rotated by said rotating means, that it induces a gas current over said processing liquid, said gas current forming from said processing liquid a mass of processing liquid having an internal circulating current on the surface of said substrate.
Dependencies are inferred from the claim text.