Process for producing thin film gas sensors with dual ion beam sputtering
AssigneeTong Yang Moolsan Co., Ltd.
InventorsYong Sahm Choe, Jae Ho Chung, Dae Seung Kim
Life of this patent
Estimating the term…
Abstract
A process for making a stoichiometric and crystalline thin film CuO catalytic layer atop a gas sensing layer for the detection of dilute sulfur compound gases. The sensing layer is made using dual ion beam sputtering, where an argon ion beam sputters targets comprising Sn or its oxides, and a pure or highly concentrated oxygen ion beam is simultaneously deposited on a substrate. The catalytic layer is made using dual ion beam sputtering, where an argon ion beam sputters targets comprising CU or its oxides, and a pure or highly concentrated oxygen ion beam is simultaneously deposited on a substrate.
Claims4
A method for forming a CuO catalytic layer atop a gas sensing layer for a gas sensor device utilizing a dual ion beam sputtering apparatus, comprising the steps of:
- sputter-depositing at least one of copper and copper-oxide atoms from a target onto a substrate using an argon ion gun;
- and
- simultaneously depositing oxygen atoms onto a gas sensing layer using an oxygen ion gun to produce a crystalline CuO layer having a thickness of approximately 0.1 nm to 10 nm to provide a p-n junction between the CuO layer and the gas sensing layer.
Dependencies are inferred from the claim text.